Material

Typical physical properties

375B

Extensive chemical resistance

375W

clean

579W

clean

675B

Extensive chemical resistance, thermamine

890B

Heat resistance , Low pressure variation

910A

Super clean

Color

black

amber

Hardness(Shore A)
Standard of Test: D2240

Tensile Strength (Mpa)

Standard of Test: D412

21.2

20.2

13.5

20.2

18.7

Elongation at Break(%)
Standard of Test: D412

183

195

205

190

150

260

Compression Set (%)

Standard of Test: D395

–

70h @ 200 degree 25% compression type B

17.1

10.6

19.3

19.2

Minimum operating temperature (℃)

-10

Minimum operating temperature (℃)

250

315

230

320

270

Category	Manufacturing Processing	Temperature	Chemical Compatibility	Recommended Materials	General Applications
Dry Wafer Processing	HDPCVD/PECVD	25-200°C	TMS, TEOS, SiH4, NH3, SiF4O2, C2F6, N2ONF3, C14	910A 890B 375W	Dynamic sealing door sewing valve isolation valve lip seal cabin cover seal
	Etching	25-200°C	Cf4, C3F8, SF6, CHF3H2, HBr, 02, BCl3, Cl2, CCl4	910A 890B 375W
	Ashing Stripping	25-200°C	Cf4, CHF3, NH3, H20, 02, Forming Gas	910A 890B 375W
High Temperature	SACVD	25-200°C	TEP, TEBO, TEOS 02, NF3	910A 890B 375W	quartz cabin seal accessories center ring pressurization seal
	Metal CVD, ALD LPCVD	150-300°C	Wf6, 03, TiCl4, Cl2, ClF3 H20, 02, NF3	890B 579W
	Oxidation Diffusion	150-300°C	N2, 02, H20, HCl , Cl2	890B 579W
	Lamp AnnealRTP	150-300°C	Resistance to IR absorption low outgassing	890B 579W
Aqueous Wafer Processing	Wafer Prep Cleaning,And Rising		UPDI, Piranha,SC-1 SC-2, 03, HF (49%)	675B	door/lip seal exclusion system seal chemical container seal accessories filter seal/connector flowmeter
	Etching	25-125°C	HNO3/HF/H2O H3PO4/ HN03	675B
	Photolithography Developing, and Rinsing	25-125°C	H2SO4 + OxidantOrganic Acids NaOHZTMAH Xylene,NMP	675B
	Stripping	25-125°C	NMP/Alkanolamine Hydroxlamine	675B
	Copper Plating	25-100°C	CuSO4 Solution H2SO4+H2O2	675B	plating equipment seal chemical resistant seal process chamber seal

My philosophy

What to Expect

Personalized Approach

Every project is unique, and I tailor my approach to fit your specific needs and goals.

Clear Communication

I keep you informed at every stage of the process and provide you regular updates.

After Support

My commitment to your success doesn't end at launch. I provide after launch support.

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